@article {Shukrun_Farrell2022-ad,
	title = {3D-printed complex-shaped chiral organosilica porous monoliths that display enantioselectivity},
	journal = {Additive Manufacturing},
	volume = {60},
	year = {2022},
	pages = {103265},
	publisher = {Elsevier},
	abstract = {We describe a new process for fabricating chiral organosilica 3D complex structures by combining digital light processing 3D printing with a sol-gel polycondensation process. The fabricated low-density objects have a high surface area with hierarchical porosity based on micropores resulting from the materials{\textquoteright} design, and on macropores in the structure resulting from the 3D printing design. Thus, several 3D objects having complex shapes were printed by the polycondensation of 3-acryloxypropyltrimethoxysilane (APTMS) and chiral silane monomers that were obtained by reacting (1R,2R)-cyclohexane-1,2-diamine or (1S,2S)-cyclohexane-1,2-diamine with (3-Isocyanatopropyl)triethoxysilane. The dual-function monomer APTMS enabled both localized photopolymerization and polycondensation. Printed gyroids, cubes, and disk-shaped chiral monoliths successfully revealed the enantioselective adsorption of tryptophan enantiomers. It was found that the macroscopic shape of the monolith affects the adsorption performance and its enantioselectivity. High enantioselectivity was obtained when the objects were formed from a chiral silane synthesized from (1R,2R)-cyclohexane-1,2-diamine: L-tryptophan was adsorbed \~{}10 fold higher than D-tryptophan. When the chiral object was fabricated using a chiral silane monomer prepared from (1S,2S)-cyclohexane-1,2-diamine, the enantioselectivity of the adsorption was reversed towards the D-tryptophan isomer. The new approach utilizes the 3D printing methodologies developed here for all-printed enantioselective separation columns; the printed macroporosity facilitates efficient flow, and the meso/microporous walls facilitate enantioselectivity.},
	keywords = {3d printing, Chiral organosilica, Selective enantiomer adsorption, Sol-Gel, Stereolithography},
	author = {Shukrun Farrell, Efrat and Siam, Reema and Moshkovitz, May Yam and Avnir, David and Abu-Reziq, Raed and Magdassi, Shlomo}
}
